Coating deposition regularity depended on orientation difference in PS-PVD plasma jet

The YSZ coatings are prepared by the plasma spray-physical vapor deposition (PS-PVD) technology based on a specific experimental design. The structure, thickness and growth angle of YSZ coatings on the entire circumferential surface of the cylindrical sample are studied. The results indicated that the structure, thickness and deflection growth angle of YSZ coatings are related to the orientation of deposition location. The numerical simulation of the multiphase mixed fluid near the substrate is carried out and the deposition regularity and mechanism of YSZ coatings prepared by PS-PVD is deduced. The growth rate is related to the local characteristics of the plasma flow field, and is directly proportional to the field pressure and inversely proportional to the field velocity. The growth angle of the coating is generally affected by the flow direction of the plasma jet. Especially, the normal component of velocity vector, V_norm, mainly affects the speed at which the coating grows vertically upwards. The tangential component of velocity vector, V_tan, determines the degree that the coating growth direction deviates from the vertical direction. When V_tan ≠ 0, the coating forms a fine column with a certain deflection angle and finally develops into an oblique columnar structure.     

脉冲能量沉积对超声速射流/激波相互作用掺混的控制研究

为探究超声速射流掺混增强的有效控制方法,基于二维非稳态雷诺平均Navier-Stokes方程,研究了脉冲能量沉积对超声速射流与斜激波相互作用后增强掺混的控制机理和规律。宽度为5 mm的低密度平面射流同向完全膨胀射入马赫数为2.5的主流中,并与20°压缩斜面所产生的斜激波相互作用。在流场中引入脉冲能量沉积对射流掺混进行控制,并考虑射流马赫数、射流长度、能量沉积位置及激励频率对掺混效果的影响。对比激励流场与基础流场,结果表明:脉冲能量沉积的加入诱导射流形成大尺度涡结构,显著提高射流的掺混效果;能量沉积位置对于不同马赫数射流的掺混增强具有不同的控制效果;激励前后射流宽度的对比表明,脉冲能量沉积的无量纲激励频率在0.22附近时,可使得射流的掺混效果最佳。     

高温氧化对EB-PVD热障涂层内部应力场分布影响的数值模拟

针对电子束物理气相沉积(EB-PVD)热障涂层(TBCs)复杂结构的特点,选用Walker黏塑性本构模型实现对其高温力学行为的准确描述.选择具有叶片曲率特征的圆管试样,并借鉴实际发动机载荷特征进行数值分析.重点考虑EB-PVD热障涂层界面的形状以及热生长氧化层(TGO)厚度变化对应力场的影响.计算结果表明,直线型界面对EB-PVD热障涂层结构的应力场改变不大,而余弦界面对EB-PVD热障涂层的应力场改变的幅度可达2倍之多;热生长氧化层的出现导致陶瓷层界面处的应力绝对值增加;无论是循环至最高温度1 050℃还是冷却到100℃时,界面波谷始终受径向压应力,此处不易形成损伤,而波峰处的应力比较大,且其应力状态是损伤容易形成的部位,可以认为是陶瓷层失效与破坏的危险点.     

气相沉积技术在产品中的应用及发展

以某系列产品中端面齿盘采用离子镀加工为例,重点介绍了气相沉积技术中的真空离子镀技术在产品上的应用过程,并以此为基础,阐述了气相沉积技术在航空产品生产中的应用前景.     

Different mechanisms controlling interannual phytoplankton variation in the South China Sea and the western North Pacific subtropical gyre: A satellite study

A time series of remotely-sensed chlorophyll a (chl a) in 1997–2010 was evaluated to determine mechanisms of phytoplankton variation in recent decade in the South China Sea (SCS) and the western North Pacific subtropical gyre (WNPSG). Satellite-derived sea surface temperature (SST) and aerosol optical thickness (AOT) were used as proxies for vertical nutrient supply and atmospheric aerosol, respectively. Chl a in the WNPSG was not significantly correlated with SST (r = 0.18, p > 0.05), but was with AOT (r = 0.31, p < 0.05), indicating the chl a was influenced by atmospheric deposition. Chl a in the SCS was negatively correlated with SST (r = −0.60, p < 0.05) and was positively with AOT (r = 0.20, p < 0.05). The correlation between AOT and chl a in the SCS does not reflect a major contribution from atmospheric deposition to chl a; instead, the relationship resulted from concurrence of the peaks of AOT and wind speed, which drive water mixing and nutrient supply. Consequently, chl a in the SCS would be regulated primarily by the nutrient supply from deep waters. Because SST was controlled by the ENSO teleconnection in the SCS, the chl a was coupled with ENSO events. The present study demonstrated that interannual phytoplankton variation could be controlled by different factors even in neighboring oligotrophic regions.     

真空等离子沉积中真空电弧的产生及触发电路的设计

在真空等离子沉积中，首先要触发真空电弧，由于等离子沉积本身所具有的复杂性，要成功地触发真空电弧必须考虑很多因素，如：阴极的材料、电极的结构、阴阳两电极之间的间隙、电极的表面状态、触发方式等。文中对影响触发电弧的因素以及在设计触发电路时需要的因素作了一定的分析，并在此基础上，提出了一个实用可靠的触发电路。     

Luminescent Nanocrystalline Silicon Carbide Thin Film Deposited by Helicon Wave Plasma Enhanced Chemical Vapour Deposition

Hydrogenated nanocrystalline silicon carbide （SIC） thin films were deposited on the single-crystal silicon substrate using the helicon wave plasma enhanced chemical vapor deposition （HW-PECVD） technique. The influences of magnetic field and hydrogen dilution ratio on the structures of SiC thin film were investigated with the atomic force microscopy （AFM）, the Fourier transform infrared absorption （FTIR） and the transmission electron microscopy （TEM）. The results indicate that the high plasma activity of the helicon wave mode proves to be a key factor to grow crystalline SiC thin films at a relative low substrate temperature. Also, the decrease in the grain sizes from the level of microcrystalline to that of nanocrystalline can be achieved by increasing the hydrogen dilution ratios. Transmission electron microscopy measurements reveal that the size of most nanocrystals in the film deposited under the higher hydrogen dilution ratios is smaller than the doubled Bohr radius of 3C-SiC （approximately 5.4 nm）, and the light emission measurements also show a strong blue photoluminescence at the room temperature, which is considered to be caused by the quantum confinement effect of small-sized SiC nanocrystals.     

描述颗粒沉积动力学演变过程的一种随机算法

为了解决普通Monte Carlo算法计算精度和计算代价无法协调的矛盾,发展了一种新的多重Monte Carlo(MMC)算法求解考虑多分散性颗粒沉积的通用动力学方程,该算法引入加权虚拟颗粒的概念,基于时间驱动MonteCarlo技术,模拟过程中保持虚拟颗粒数目和计算区域体积不变。首先详细介绍了考虑颗粒沉积的MMC算法,包括时间步长的设置、颗粒是否沉积的判断、沉积后果的处理等。然后选定三个存在理论分析解的特殊工况对MMC算法进行验证,数值模拟结果与相应的理论分析解符合很好,表明该算法具有较高的计算精度,同时该算法计算代价很小。     

Dy对EB-PVDβ-NiAl涂层高温瞬态氧化行为的影响(英文)

β-NiAl是一种有前景的应用于1150°C以上的抗氧化涂层材料。本文利用电子束物理气相沉积(EB-PVD)方法制备了0~0.5at%Dy含量的β-NiAl涂层,研究了涂层的瞬态氧化行为。1200°C时,在0.05at%Dy掺杂的涂层中只观察到了稳态α-Al2O3相,而在0.5at%Dy掺杂的涂层中,1h氧化过程中,发生了θ-Al2O3到α-Al2O3的相变。1100°C时,在最初的15min所有涂层均发生了θ-α相变。0.05at%Dy掺杂的涂层在45min的时候相变已经完成,这比0.5at%Dy掺杂涂层要早得多。过量Dy的掺杂能够延缓θ-α相变。未掺杂和过量掺杂涂层在20h氧化之后仍存在针状相θ-Al2O3,而0.05at%Dy掺杂的涂层中则为经典的颗粒状α-Al2O3形貌。     

典型管路RP-3航空煤油热氧化结焦特性试验研究

结合航空发动机燃烧室燃油喷嘴内部典型油路结构特点,基于恒定环境温度的试验方法,针对直管、螺旋管和直角弯管三种结构油路试验件,开展RP-3航空煤油的结焦沉积特性研究。试验结果表明：直管沿程结焦量均呈现出先增大后减小的趋势,结焦量的峰值出现在试验件的中后部;直角弯管的沿程结焦量在弯曲段迅速增加,结焦量峰值位置和直管相比大幅提前,峰值后,结焦量在弯曲段整体保持较高的水平,当进入出口平直段开始下降;螺旋管的沿程结焦量分布呈现明显的双峰值形式,第一个峰值的位置比直管更加提前。三种结构中,螺旋管的单位面积结焦量最大,在燃油进口速度为2m/s时,其值约是直角弯管的2.46倍,直管的单位面积结焦量最小。